Channel Length Scaling Pattern for Cylindrical Surrounding Double-Gate (CSDG) MOSFET

Maduagwu Anthony Uchechukwu; Viranjay M. Srivastava

doi:10.1109/ACCESS.2020.3006705

Channel Length Scaling Pattern for Cylindrical Surrounding Double-Gate (CSDG) MOSFET

Maduagwu Anthony Uchechukwu^*, Viranjay M. Srivastava

^*Corresponding author for this work

University of KwaZulu-Natal

Research output: Contribution to journal › Article › peer-review

27 Citations (SciVal)

Original language	English
Article number	9131785
Pages (from-to)	121204-121210
Number of pages	7
Journal	IEEE Access
Volume	8
DOIs	https://doi.org/10.1109/ACCESS.2020.3006705
Publication status	Published (VoR) - 2020

Keywords

Channel length
CSDG MOSFET
nanotechnology
natural length
scaling pattern semiconductors
short channel effects (SCEs)
VLSI

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10.1109/ACCESS.2020.3006705

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@article{d0a5912039314cbda22595180750cd68,

title = "Channel Length Scaling Pattern for Cylindrical Surrounding Double-Gate (CSDG) MOSFET",

keywords = "Channel length, CSDG MOSFET, nanotechnology, natural length, scaling pattern semiconductors, short channel effects (SCEs), VLSI",

author = "Uchechukwu, {Maduagwu Anthony} and Srivastava, {Viranjay M.}",

note = "Publisher Copyright: {\textcopyright} 2013 IEEE.",

year = "2020",

doi = "10.1109/ACCESS.2020.3006705",

language = "English",

volume = "8",

pages = "121204--121210",

journal = "IEEE Access",

issn = "2169-3536",

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T1 - Channel Length Scaling Pattern for Cylindrical Surrounding Double-Gate (CSDG) MOSFET

AU - Uchechukwu, Maduagwu Anthony

AU - Srivastava, Viranjay M.

PY - 2020

Y1 - 2020

KW - Channel length

KW - CSDG MOSFET

KW - nanotechnology

KW - natural length

KW - scaling pattern semiconductors

KW - short channel effects (SCEs)

KW - VLSI

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U2 - 10.1109/ACCESS.2020.3006705

DO - 10.1109/ACCESS.2020.3006705

M3 - Article

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SN - 2169-3536

VL - 8

SP - 121204

EP - 121210

JO - IEEE Access

JF - IEEE Access

M1 - 9131785

ER -

Channel Length Scaling Pattern for Cylindrical Surrounding Double-Gate (CSDG) MOSFET

Keywords

Access to Document

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