Design of Cylindrical Surrounding Double-Gate MOSFET With Fabrication Steps Using a Layer-by-Layer Approach

Naveenbalaji Gowthaman*, Viranjay M. Srivastava

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    3 Citations (SciVal)
    Original languageEnglish
    Pages (from-to)116059-116068
    Number of pages10
    JournalIEEE Access
    Volume10
    DOIs
    Publication statusPublished (VoR) - 2022

    Keywords

    • Channel dopant
    • cylindrical surrounding double-gate (CSDG) MOSFET
    • double-gate (DG) MOSFET
    • gate modeling
    • high-dielectrics
    • nanotechnology
    • VLSI

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