@inproceedings{33a29b93e2ee4edd849f9690c6aa0b53,
title = "Dielectric Material (HfO2) Effect on Surface Potential for CSDG MOSFET",
keywords = "CSDG MOSFET, Dielectric material, Double-gate MOSFET, Microelectronics, Nanotechnology, Surface potential, VLSI",
author = "Mandisi Shunqukela and Srivastava, {Viranjay M.}",
note = "Publisher Copyright: {\textcopyright} 2018 IEEE.; 8th International Conference on Computer Communication and Informatics, ICCCI 2018 ; Conference date: 04-01-2018 Through 06-01-2018",
year = "2018",
month = aug,
day = "20",
doi = "10.1109/ICCCI.2018.8441369",
language = "English",
isbn = "9781538622384",
series = "2018 International Conference on Computer Communication and Informatics, ICCCI 2018",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
booktitle = "2018 International Conference on Computer Communication and Informatics, ICCCI 2018",
}