@inproceedings{3722aa4c7daf47188b7072d2bcae567e,
title = "Effect of Gate-lap and Oxide Material at 10-nm FinFET Device Performance",
keywords = "FinFET, Gate-lap lengths, Microelectronics, Short channel effects, VLSI",
author = "Dargar, {Shashi K.} and Srivastava, {Viranjay M.}",
note = "Publisher Copyright: {\textcopyright} 2018 IEEE.; 2018 International Conference on Advanced Computation and Telecommunication, ICACAT 2018 ; Conference date: 28-12-2018 Through 29-12-2018",
year = "2018",
month = dec,
doi = "10.1109/ICACAT.2018.8933763",
language = "English",
series = "2018 International Conference on Advanced Computation and Telecommunication, ICACAT 2018",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
booktitle = "2018 International Conference on Advanced Computation and Telecommunication, ICACAT 2018",
}