Realization with fabrication of double-gate MOSFET based boost regulator

Sipho Khumalo; Viranjay M. Srivastava

doi:10.1016/j.matpr.2022.01.116

Realization with fabrication of double-gate MOSFET based boost regulator

Sipho Khumalo, Viranjay M. Srivastava^*

^*Corresponding author for this work

University of KwaZulu-Natal

Research output: Contribution to journal › Article › peer-review

4 Citations (SciVal)

Original language	English
Pages (from-to)	827-834
Number of pages	8
Journal	Materials Today: Proceedings
Volume	59
DOIs	https://doi.org/10.1016/j.matpr.2022.01.116
Publication status	Published (VoR) - Jan 2022

Keywords

Boost regulator
Double-gate MOSFET
MOSFET
Silicon technology
SiO
VLSI

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10.1016/j.matpr.2022.01.116

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@article{2fc1203d871a4bee9a51db97fabb2081,

title = "Realization with fabrication of double-gate MOSFET based boost regulator",

keywords = "Boost regulator, Double-gate MOSFET, MOSFET, Silicon technology, SiO, VLSI",

author = "Sipho Khumalo and Srivastava, \{Viranjay M.\}",

note = "Publisher Copyright: {\textcopyright} 2022",

year = "2022",

month = jan,

doi = "10.1016/j.matpr.2022.01.116",

language = "English",

volume = "59",

pages = "827--834",

journal = "Materials Today: Proceedings",

issn = "2214-7853",

}

TY - JOUR

T1 - Realization with fabrication of double-gate MOSFET based boost regulator

AU - Khumalo, Sipho

AU - Srivastava, Viranjay M.

PY - 2022/1

Y1 - 2022/1

KW - Boost regulator

KW - Double-gate MOSFET

KW - MOSFET

KW - Silicon technology

KW - SiO

KW - VLSI

UR - https://www.scopus.com/pages/publications/85131238294

UR - https://www.scopus.com/inward/citedby.url?scp=85131238294&partnerID=8YFLogxK

U2 - 10.1016/j.matpr.2022.01.116

DO - 10.1016/j.matpr.2022.01.116

M3 - Article

AN - SCOPUS:85131238294

SN - 2214-7853

VL - 59

SP - 827

EP - 834

JO - Materials Today: Proceedings

JF - Materials Today: Proceedings

ER -

Realization with fabrication of double-gate MOSFET based boost regulator

Keywords

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